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Surface processes in low-pressure capacitive radio frequency discharges driven by tailored voltage waveforms
Plasma Sources Science and Technology ( IF 3.8 ) Pub Date : 2020-07-12 , DOI: 10.1088/1361-6595/ab9156
A Derzsi 1, 2 , B Horvth 2 , Z Donk 2 , J Schulze 1, 3, 4
Affiliation  

Particle-in-cell/Monte Carlo collisions (PIC/MCC) simulations are performed to investigate the sputtering and the secondary electron emission (SEE) in geometrically symmetric capacitively coupled Ar discharges with Cu electrodes driven by tailored voltage waveforms (TVWs). The driving voltage waveform is composed of multiple consecutive harmonics (1 ⩽ N ⩽ 4) of the fundamental frequency (13.56 MHz) and is tailored by adjusting the identical phases ( θ ) of the even harmonics. The simulations are based on a discharge model in which realistic approaches are implemented for the description of the SEE induced by electrons and heavy-particles at the electrodes, as well as for the sputtering of the electrodes by heavy-particles. In case of applying a single frequency, the voltage amplitude is varied (250 V ⩽ ϕ 1 ⩽ 2500 V), while in case of applying multi-frequency TVWs, N and θ are varied at a fixed total voltage amplitude ( ϕ tot...

中文翻译:

由定制电压波形驱动的低压电容性射频放电中的表面过程

进行了单元内粒子/蒙特卡洛碰撞(PIC / MCC)模拟,以研究由定制电压波形(TVW)驱动的具有Cu电极的几何对称电容耦合Ar放电中的溅射和二次电子发射(SEE)。驱动电压波形由基频(13.56 MHz)的多个连续谐波(1⩽N⩽4)组成,并通过调整偶数谐波的相同相位(θ)进行定制。该模拟基于放电模型,在该模型中,采用了现实的方法来描述由电子和重粒子在电极处感应的SEE,以及由重粒子对电极进行溅射。在施加单个频率的情况下,电压幅度会发生变化(250 V ϕ 1⩽2500 V),
更新日期:2020-07-13
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