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Fabrication of plate-like Ta3N5 crystals through evaporation–deposition–re-evaporation of alkali halide fluxes onto tantalum substrates
CrystEngComm ( IF 3.1 ) Pub Date : 2020-07-10 , DOI: 10.1039/d0ce00806k
Hajime Wagata 1, 2, 3, 4, 5 , Minori Yanai 5, 6, 7, 8, 9 , Daewook Kim 5, 8, 9, 10 , Sayaka Suzuki 5, 7, 8, 9, 11 , Mirabbos Hojamberdiev 5, 7, 8, 9, 11 , Kunio Yubuta 5, 12, 13, 14 , Chiaki Terashima 5, 8, 9, 10, 15 , Katsuya Teshima 5, 7, 8, 9, 11
Affiliation  

Ta3N5 nanostructured films have been explored as photoanodes for photoelectrochemical water splitting. Despite a number of efforts, it is still difficult to control the facet of single-crystalline Ta3N5, which directly affects the properties, due to its harsh growth conditions. In addition, the fabrication methods of Ta3N5 films involve complex multi-step procedures and/or require complicated equipment. In this study, we report on facile fabrication of plate-like Ta3N5 crystals with predominant {010} crystallographic planes covering the Ta substrate surface by flux growth under an ammonia gas flow. Among alkali halide fluxes (KF, KCl, and KI), KF emerged as an effective flux for the growth of Ta3N5 crystals. Combining KF and KI promoted further crystal growth, producing larger Ta3N5 crystals. The crystals were confirmed as single-crystalline by TEM. The crystal growth process and shape evolution in the flux were investigated and discussed.

中文翻译:

通过碱金属卤化物熔剂在钽衬底上的蒸发-沉积-再蒸发来制备板状Ta3N5晶体

Ta 3 N 5纳米结构薄膜已被研究用作光电化学水分解的光阳极。尽管做出了许多努力,但是由于其苛刻的生长条件,仍然难以控制直接影响性能的单晶Ta 3 N 5的晶面。另外,Ta 3 N 5膜的制造方法涉及复杂的多步骤程序和/或需要复杂的设备。在这项研究中,我们报告了板状Ta 3 N 5的容易制造在氨气流下,通过助熔剂生长,具有主要{010}晶面覆盖Ta衬底表面的晶体。在碱金属卤化物通量(KF,KCl和KI)中,KF成为Ta 3 N 5晶体生长的有效通量。KF和KI的结合促进了晶体的进一步生长,产生了更大的Ta 3 N 5晶体。通过TEM确认晶体为单晶。研究并讨论了熔剂中的晶体生长过程和形状演变。
更新日期:2020-09-14
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