Some extremely reactive metals like Ce, U, and Pu are easily oxidized; instead of forming a stable surface oxide layer preventing further oxidation, the oxide layer break into powders as exposed to air in few days. For nuclear mineral industry, these materials need to be in storage for 1 month or so, which need to minimize surface oxidation. To provide a novel way to storage, atomic layer deposition (ALD) of thin Al₂O₃ film on the Ce metal surface is demonstrated, which prevents the oxidation of Ce for 40 days with just 2 nm of Al₂O₃. ALD also minimizes the foreign elements of passivation materials with great uniformity for different shapes, which unveils the potential for extremely reactive metal passivation in nuclear industry.

中文翻译：

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暴露于空气中的原子层沉积对铈金属的抗氧化保护

某些极易反应的金属，例如Ce，U和Pu容易被氧化；代替形成稳定的表面氧化物层以防止进一步氧化，该氧化物层在暴露于空气中几天后会破碎成粉末。对于核矿物工业，这些材料需要存储1个月左右，这需要使表面氧化最小化。为了提供一种新颖的存储方式，已证明了在Ce金属表面上薄的Al ₂ O ₃薄膜的原子层沉积（ALD），这仅用2 nm的Al ₂ O ₃就能防止Ce氧化40天。ALD还最大程度地减少了钝化材料中异物的均匀性，使其具有不同的形状，这揭示了核工业中极易反应金属钝化的潜力。