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Pulsed laser deposition of the LaVO 4 :Eu, Ca nanoparticles on glass and silicon substrates
Applied Nanoscience ( IF 3.869 ) Pub Date : 2020-07-08 , DOI: 10.1007/s13204-020-01503-x
O. Chukova , S. A. Nedilko , S. G. Nedilko , T. Voitenko , M. Androulidaki , A. Manousaki , A. Papadopoulos , K. Savva , E. Stratakis

Thin films from the LaVO4:Eu, Ca nanoparticles were successfully grown by pulsed laser deposition method on glass and silicon substrates for the first time. Morphology and thickness of the films depend on the type of substrate and number of pulses. The films are of 27–220 nm thickness and formed by very small particles (up to 20 nm) and also can contain single nanoparticles with dimensions of 40–60 nm and sometimes agglomerates of nanoparticles. Spectral properties of the samples have been investigated and discussed. The vanadate films deposited on the silicon substrates lead to appearance of antireflection properties in the visible range. Luminescence spectra of the investigated films consist of narrow lines caused by f–f transitions in the Eu3+ ions. For the samples on glass substrates the wide bands of glass emission also contributed to the spectra. The optimal experimental conditions which allowed to obtain films with promising applications as luminescent converters are considered.



中文翻译:

在玻璃和硅基板上脉冲激光沉积LaVO 4:Eu,Ca纳米粒子

来自LaVO 4:Eu,Ca纳米粒子的薄膜首次通过脉冲激光沉积法成功地在玻璃和硅基板上生长。薄膜的形态和厚度取决于基底的类型和脉冲数。膜的厚度为27–220 nm,由很小的颗粒(最大20 nm)形成,还可以包含尺寸为40–60 nm的单个纳米颗粒,有时还包含纳米颗粒的团聚体。已经研究和讨论了样品的光谱特性。沉积在硅衬底上的钒酸盐膜导致在可见光范围内出现抗反射性能。被研究薄膜的发光光谱由Eu 3+中f–f跃迁引起的细线组成离子。对于玻璃基板上的样品,宽的玻璃发射带也有助于光谱。考虑了能够获得具有前景的薄膜作为发光转换器的最佳实验条件。

更新日期:2020-07-08
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