In-situ characterization of the development step of high-resolution e-beam resists,Microelectronic Engineering

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In-situ characterization of the development step of high-resolution e-beam resists
Microelectronic Engineering ( IF 2.3 ) Pub Date : 2020-07-01 , DOI: 10.1016/j.mee.2020.111397
T. Mpatzaka , G. Papageorgiou , N. Papanikolaou , E. Valamontes , Th. Ganetsos , D. Goustouridis , I. Raptis , G. Zisis

This article has been withdrawn at the request of the author(s) and published in Micro and Nano Engineering. The Publisher apologizes for any inconvenience this may cause. The full Elsevier Policy on Article Withdrawal can be found at https://www.elsevier.com/about/our-business/policies/article-withdrawal

中文翻译：

高分辨率电子束抗蚀剂开发步骤的原位表征

本文已应作者要求撤回，发表于Micro and Nano Engineering。出版商对此可能造成的任何不便深表歉意。完整的 Elsevier 文章撤回政策可在 https://www.elsevier.com/about/our-business/policies/article-withdrawal 找到

更新日期：2020-07-01

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