Abstract The combined influence of temperature, hydrostatic pressure, and applied aluminum concentration on the magneto-optical properties of GaAs/AlμGa1−μAs quantum wells (QWs) is presented by considering the combined influences of them on the magnetophonon resonance absorption power (AP) and the full width at half maximum (FWHM) of the optically detected magneto-phonon resonance (ODMPR) peaks for both phonon absorption and emission processes when phonons are confined to describe by Huang and Zhu. The numerical results denote that the AP and the FWHM have great influence (strong dependence) on the applied aluminum concentration, the temperature, and hydrostatic pressure. Moreover, the results also indicate the value and variation of the FWHM with applied aluminum concentration, hydrostatic pressure, as well as temperature of the ODMPR peak for phonon absorption processes is always larger and faster in comparison with that phonon emission process for both the confined and bulk phonons. Especially, when the phonons are confined, the more pronounced these properties are.

中文翻译：

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当声子受限时，温度、静水压力和铝浓度对 GaAs/Al Ga1−μAs 量子阱磁光特性的综合影响

摘要 通过考虑温度、静水压力和外加铝浓度对 GaAs/AlμGa1−μAs 量子阱 (QWs) 磁光性能的综合影响，通过考虑它们对磁声子共振吸收功率 (AP) 和当声子仅限于由 Huang 和 Zhu 描述时，声子吸收和发射过程的光学检测磁声子共振 (ODMPR) 峰的半峰全宽 (FWHM)。数值结果表明 AP 和 FWHM 对应用的铝浓度、温度和静水压力有很大影响（强依赖性）。此外，结果还表明了 FWHM 的值和随施加的铝浓度、静水压力、以及声子吸收过程的 ODMPR 峰的温度与受限声子和体声子的声子发射过程相比总是更大和更快。特别是，当声子受到限制时，这些特性越明显。