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Multifractal Surface Characteristics of Thin, Gas-Sensitive, Copper-Containing Polyacrylonitrile Films
Surface Engineering and Applied Electrochemistry Pub Date : 2020-07-02 , DOI: 10.3103/s1068375520030151
T. V. Semenistaya , N. K. Plugotarenko

Abstract

Using the atomic force microscopy method, the surface of thin, copper-containing polyacrylonitrile (PAN) films is studied. The distribution function over the height of the surface profile is analyzed by the method of multifractal detrended fluctuation analysis (MFDFA). The fractal dimension, correlation dimension, scaling exponent, and Hurst exponent (H) are used as parameters in this analysis. The results of studying the surface of thin, copper-containing PAN films by the MFDFA method confirm the assumption about the multifractal nature of the surface. Technological parameters in the production of films determine the frequency of occurrence of structures with different fractal dimensions on the film surfaces, which is reflected in the Hurst exponent. A bend is present in the multifractal spectrum in those cases when the films show gas sensitivity with a coefficient of S = 0.35 or higher.


中文翻译:

气体敏感的含铜聚丙烯腈薄膜的多重分形表面特性

摘要

使用原子力显微镜法,研究了含铜的聚丙烯腈(PAN)薄膜的表面。通过多重分形趋势波动分析(MFDFA)方法分析了表面轮廓高度上的分布函数。分形维数,相关维数,缩放指数和赫斯特指数(H)用作此分析中的参数。通过MFDFA方法研究薄的含铜PAN薄膜表面的结果证实了有关表面多重分形性质的假设。薄膜生产中的技术参数决定了薄膜表面上具有不同分形维数的结构的出现频率,这在赫斯特指数中得到了反映。当薄膜显示出气体敏感度且系数S = 0.35或更高时,在多重分形光谱中会出现弯曲。
更新日期:2020-07-02
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