A photoresist system for 3D two‐photon microprinting is presented, which enables the printing of inherently nanoporous structures with mean pore sizes around 50 nm by means of self‐organization on the nanoscale. A phase separation between polymerizable and chemically inert photoresist components leads to the formation of 3D co‐continuous structures. Subsequent washing‐out of the unpolymerized phase reveals the porous polymer structures. To characterize the volume properties of the printed structures, scanning electron microscopy images are recorded from ultramicrotome sections. In addition, the light‐scattering properties of the 3D‐printed material are analyzed. By adjusting the printing parameters, the porosity can be controlled during 3D printing. As an application example, a functioning miniaturized Ulbricht light‐collection sphere is 3D printed and tested.

中文翻译：

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纳米多孔结构的3D两光子微打印。

提出了一种用于3D双光子微打印的光刻胶系统，该系统可以通过纳米级的自组织方式来打印固有的纳米孔结构，其平均孔径约为50 nm。可聚合和化学惰性光致抗蚀剂组分之间的相分离导致3D共连续结构的形成。随后未聚合相的洗净显示出多孔聚合物结构。为了表征印刷结构的体积特性，从超薄切片上记录了扫描电子显微镜图像。此外，还分析了3D打印材料的光散射特性。通过调整打印参数，可以在3D打印过程中控制孔隙率。作为一个应用示例，