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CVD Growth of Porous Graphene Foam in Film Form
Matter ( IF 18.9 ) Pub Date : 2020-07-01 , DOI: 10.1016/j.matt.2020.06.012
Ming Huang , Chunhui Wang , Le Quan , Thi Hai-Yen Nguyen , Hanyang Zhang , Yi Jiang , Gangil Byun , Rodney S. Ruoff

Porous Cu/Ni foils were made by electroplating Ni on Cu foils and used as templates for chemical vapor deposition growth of porous graphene foam. The walls in the graphene foam were found to be two to five graphene layers thick, interconnected to form a low-density porous network with a wide distribution of pore sizes and a high electrical conductivity. A comprehensive comparison with previously studied materials for electromagnetic interference (EMI) shielding showed that this graphene foam is among the best EMI shielding materials; its specific EMI shielding effectiveness (>720 dB cm3 g−1) and absolute effectiveness (>45,000 dB cm2 g−1) are superior to those of most other materials. This graphene foam has a large absorption capacity for various organic solvents and oils and adsorbs them within seconds. The synthesis strategy should provide a general approach for generating other 3D porous structures, including those based on a variety of known 2D materials, for various applications.



中文翻译:

CVD法成膜生长多孔石墨烯泡沫

多孔Cu / Ni箔是通过将Ni电镀在Cu箔上制成的,并用作多孔石墨烯泡沫化学气相沉积生长的模板。发现石墨烯泡沫中的壁厚为两到五个石墨烯层,相互连接以形成具有宽孔径分布和高电导率的低密度多孔网络。与先前研究的电磁干扰(EMI)屏蔽材料进行的全面比较表明,这种石墨烯泡沫是最好的EMI屏蔽材料之一。其特定的EMI屏蔽效果(> 720 dB cm 3 g -1)和绝对效果(> 45,000 dB cm 2 g -1))优于大多数其他材料。这种石墨烯泡沫对各种有机溶剂和油具有很大的吸收能力,并在几秒钟内吸收它们。合成策略应提供一种通用方法来生成其他3D多孔结构,包括用于各种应用的基于各种已知2D材料的那些结构。

更新日期:2020-07-01
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