Nanoimprint lithography (NIL) is one of the most promising nanofabrication techniques. Soft NIL has inherent advantages for conformal contact and uneven substrates. The demolding process of soft NIL is critical for obtaining high-fidelity replicas, especially of multidirectional nanostructures. In this paper, a demolding device for soft NIL is proposed to separate the polymer replica from the mold vertically and improve its quality. The finite element method was used to simulate the demolding process and calculate the developed stresses. The results demonstrated that no undesired plastic deformation was generated by the proposed demolding device. Successful fabrication of high-fidelity nanograting patterns verified the ability of the demolding device to improve the demolding quality of high-aspect-ratio and multidirectional structures fabricated by soft NIL.

中文翻译：

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纳米压印光刻技术改善多方向纳米结构的脱模

纳米压印光刻 (NIL) 是最有前途的纳米制造技术之一。软 NIL 对于保形接触和不平整的基材具有先天优势。软 NIL 的脱模过程对于获得高保真复制品至关重要，尤其是多向纳米结构的复制品。在本文中，提出了一种用于软 NIL 的脱模装置，以将聚合物复制品与模具垂直分离并提高其质量。使用有限元方法来模拟脱模过程并计算产生的应力。结果表明，所提出的脱模装置没有产生不希望的塑性变形。