Frontiers in Physics ( IF 3.1 ) Pub Date : 2020-05-28 , DOI: 10.3389/fphy.2020.00231 Ruichao Zhu , Jiafu Wang , Sai Sui , Yueyu Meng , Tianshuo Qiu , Yuxiang Jia , Xiaofeng Wang , Yajuan Han , Mingde Feng , Lin Zheng , Shaobo Qu
Plasmonic structures that support the spoof surface plasmon polariton (SSPP) mode can be tailored to achieve strong absorption of electromagnetic (EM) waves. In particular, the profile of an absorbing plasmonic structure (APS) plays an important role in realizing its wideband absorption performance. In this paper, we propose a method of optimizing the longitudinal profile of APS based on Genetic Algorithm (GA), with the aim of obtaining high-efficiency wideband absorption of EM waves. The APS unit cell is composed of a longitudinal array of metallic strips, the length profile of which can be optimized to improve
中文翻译:
基于遗传算法的轮廓优化宽带吸收等离子体结构
可以定制支持欺骗性表面等离振子极化(SSPP)模式的等离激元结构,以实现对电磁(EM)波的强吸收。特别地,吸收性等离子体结构(APS)的轮廓在实现其宽带吸收性能中起重要作用。本文提出了一种基于遗传算法(GA)的优化APS纵剖面的方法,旨在获得EM波的高效宽带吸收。APS晶胞由金属条的纵向阵列组成,其长度分布可以优化以改善