Abstract In this study, thin Al2O3 films (11 nm – 82 nm) were deposited by means of a recently developed pulse gas injection magnetron sputtering method and investigated by means of atomic force microscopy, spectroscopic ellipsometry and spectrophotometry. Quite low values of optical constants (1.581 to 1.648 at λ = 550 nm) of the alumina films are directly associated with specific growth conditions (pulse injection of the reactive or reactive + inert gas) in the pulse gas injection magnetron sputtering process. The light transmittance of Al2O3/glass systems (86 % to 90 %) is only a few percent lower than that calculated for glass (93 %).

中文翻译：

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在工业条件下通过磁控溅射技术沉积的薄 Al2O3 层的光学表征，用于玻璃应用

摘要 在这项研究中，通过最近开发的脉冲气体注入磁控溅射方法沉积了薄的 Al2O3 薄膜（11 nm - 82 nm），并通过原子力显微镜、光谱椭偏仪和分光光度法进行了研究。在脉冲气体注入磁控溅射过程中，氧化铝薄膜的光学常数值（λ = 550 nm 时为 1.581 至 1.648）的很低值与特定的生长条件（反应性或反应性 + 惰性气体的脉冲注入）直接相关。Al2O3/玻璃系统的透光率（86% 至 90%）仅比计算的玻璃（93%）低几个百分点。