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Rolling Nanoelectrode Lithography.
Micromachines ( IF 3.4 ) Pub Date : 2020-06-30 , DOI: 10.3390/mi11070656
Rashed Md Murad Hasan 1 , Xichun Luo 1 , Jining Sun 2
Affiliation  

Non-uniformity and low throughput issues severely limit the application of nanoelectrode lithography for large area nanopatterning. This paper proposes, for the first time, a new rolling nanoelectrode lithography approach to overcome these challenges. A test-bed was developed to realize uniform pressure distribution over the whole contact area between the roller and the silicon specimen, so that the local oxidation process occurred uniformly over a large area of the specimen. In this work, a brass roller wrapped with a fabricated polycarbonate strip was used as a stamp to generate nanopatterns on a silicon surface. The experimental results show that a uniform pattern transfer for a large area can be achieved with this new rolling nanoelectrode lithography approach. The rolling speed and the applied bias voltage were identified as the primary control parameters for oxide growth. Furthermore, the pattern direction showed no significant influence on the oxide process. We therefore demonstrated that nanoelectrode lithography can be scaled up for large-area nanofabrication by incorporating a roller stamp.

中文翻译:

滚动纳米电极光刻。

非均匀性和低通量问题严重限制了纳米电极光刻技术在大面积纳米图案化中的应用。本文首次提出了一种新的滚动纳米电极光刻技术来克服这些挑战。开发了一个试验台,以实现在辊和硅试样之间的整个接触区域上均匀的压力分布,从而使局部氧化过程在试样的大面积上均匀地发生。在这项工作中,将包裹有制成的聚碳酸酯带的黄铜辊用作压模,以在硅表面上生成纳米图案。实验结果表明,使用这种新的滚动纳米电极光刻方法可以实现大面积的均匀图案转移。轧制速度和施加的偏压被确定为氧化物生长的主要控制参数。此外,图案方向对氧化过程没有显着影响。因此,我们证明了通过结合滚轴印模,纳米电极光刻可以按比例放大以用于大面积纳米加工。
更新日期:2020-06-30
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