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A facile and cost-effective approach for the fabrication Bi0.5Na0.5TiO3 thick films on flexible substrate for energy storage capacitor applications
Ceramics International ( IF 5.2 ) Pub Date : 2020-11-01 , DOI: 10.1016/j.ceramint.2020.06.298
Muhammad Asif Rafiq , Adnan Maqbool , Imran Hussain Khan , Muhammad Umar Manzoor , Ahmad Shuaib , Abbas Saeed Hakeem

Abstract The current research reports a facile and cost-effective technique for the deposition of functional ceramics Bi0.5Na0.5TiO3 thick films on flexible, low cost, electrically integrateable Ni substrate by using electrophoretic deposition (EPD) technique. EPD is a well-known, eco-friendly process for depositing coatings on a conductive substrate from a colloidal suspension. A reliable approach was adopted for stable colloidal suspension of BNT particles during conventional solid-state synthesis process by using high energy ball milling in acetone medium without the complications of surfactants and expensive platinum substrate. BNT films with thickness ranging from ~55 to 165 μm were successfully obtained by exploring EPD parameters i.e. voltage from 100 to 125 V and coating time from 30 to 240 s. Thick coatings with comparatively better adhesiveness were deposited at 100 and 125 V with coating time up to 90 s. Thick films were densified by sintering at 1150 °C for 30 min. Phase analysis were conducted by using X-Ray diffraction (XRD), Fourier transformed infrared spectroscopy and Raman spectroscopy. XRD analysis revealed the formation of single (111) peak indicating the pure perovskite structure of BNT thick film. Scanning electron microscope studies indicated that dense and uniform microstructure was obtained by EPD coating with the film thickness of ~93 μm. Impedance spectroscopy confirmed two electrically active regions of grain interior and grain boundaries.

中文翻译:

一种在柔性基板上制备 Bi0.5Na0.5TiO3 厚膜的简便且具有成本效益的方法,用于储能电容器应用

摘要 目前的研究报告了一种使用电泳沉积 (EPD) 技术在柔性、低成本、可电集成的 Ni 基板上沉积功能陶瓷 Bi0.5Na0.5TiO3 厚膜的简便且经济高效的技术。EPD 是一种众所周知的环保工艺,用于从胶体悬浮液在导电基材上沉积涂层。在传统的固态合成过程中,通过在丙酮介质中使用高能球磨,采用了一种可靠的方法来稳定 BNT 颗粒的胶体悬浮液,而没有表面活性剂和昂贵的铂基底的并发症。通过探索 EPD 参数,即 100 至 125 V 的电压和 30 至 240 秒的涂层时间,成功获得了厚度范围为~55 至 165 μm 的 BNT 薄膜。在 100 和 125 V 电压下沉积具有较好粘附性的厚涂层,涂层时间长达 90 秒。厚膜通过在 1150°C 下烧结 30 分钟而致密。通过使用X射线衍射(XRD)、傅里叶变换红外光谱和拉曼光谱进行相分析。XRD 分析显示形成单 (111) 峰,表明 BNT 厚膜的纯钙钛矿结构。扫描电子显微镜研究表明,EPD 涂层获得了致密且均匀的微观结构,膜厚约为 93 μm。阻抗谱证实了晶粒内部和晶界的两个电活性区域。通过使用X射线衍射(XRD)、傅里叶变换红外光谱和拉曼光谱进行相分析。XRD 分析显示形成单 (111) 峰,表明 BNT 厚膜的纯钙钛矿结构。扫描电子显微镜研究表明,EPD 涂层获得了致密且均匀的微观结构,膜厚约为 93 μm。阻抗谱证实了晶粒内部和晶界的两个电活性区域。通过使用X射线衍射(XRD)、傅里叶变换红外光谱和拉曼光谱进行相分析。XRD 分析显示形成单 (111) 峰,表明 BNT 厚膜的纯钙钛矿结构。扫描电子显微镜研究表明,EPD 涂层获得了致密且均匀的微观结构,膜厚约为 93 μm。阻抗谱证实了晶粒内部和晶界的两个电活性区域。
更新日期:2020-11-01
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