Performance degradation in analog circuits due to layout dependent effects (LDEs) has become increasingly challenging in advanced technologies. To address this issue, LDEs have to be seriously considered as performance constraints in the physical design process. In this article, we have proposed an innovative LDE-aware retargeting methodology for analog layout migration from old technologies to new ones with LDEs optimized for performance preservation. The LDE constraints, which are first identified with the aid of a specialized sensitivity analysis scheme, are satisfied during the layout migration process. Moreover, optical proximity correction (OPC), as one of the most popular resolution enhancement techniques for subwavelength lithography in modern nanometer technology manufacturing, is also included in this study. We have developed an OPC-inclusive ILP-based analog router to route electrical nets for improving image fidelity of the final layout while the routability and other analog constraints are respected in the meantime. The experimental results show our proposed layout migration methodology along with the routing scheme is able to retarget analog layouts with better circuit performance and finer image quality compared to the previous works.

中文翻译：

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使用包含 OPC 的路由进行 LDE 感知模拟布局迁移

由于布局相关效应 (LDE) 导致的模拟电路性能下降在先进技术中变得越来越具有挑战性。为了解决这个问题，必须认真考虑 LDE 作为物理设计过程中的性能限制。在本文中，我们提出了一种创新的 LDE 感知重定向方法，用于将模拟布局从旧技术迁移到新技术，并优化 LDE 以保持性能。LDE 约束首先借助专门的灵敏度分析方案确定，在版图迁移过程中得到满足。此外，光学邻近校正 (OPC) 作为现代纳米技术制造中最流行的亚波长光刻分辨率增强技术之一，也包含在本研究中。我们开发了一种包含 OPC 的基于 ILP 的模拟路由器，用于对电网进行布线，以提高最终布局的图像保真度，同时考虑可布线性和其他模拟约束。实验结果表明，与之前的工作相比，我们提出的布局迁移方法以及布线方案能够以更好的电路性能和更精细的图像质量重新定位模拟布局。