Abstract Deuterium (D) plasma driven permeation (PDP) experiments for tungsten (W) samples were conducted by a linear radio frequency (RF) plasma device. In the PDP experiment, the W sample surface is perpendicular to the grain elongation direction. The D ion flux is in the order of 1021 m−2 s−1 determined by a double Langmuir probe. The results show that bias had a limited effect on the D plasma driven permeation behavior. The D recombination coefficient on W surface is obtained at the temperature ranging from 740 K to 1031 K. The experimentally measured recombination coefficient for a pristine W surface is lower than that for a clean W surface. The effect of recombination coefficient on the D permeation and retention behaviors in W are studied by Hydrogen Isotope Diffusion and Trapping (HIDT) simulation code. The low recombination coefficient leads to a high D concentration in W and a high permeation rate at the back surface. The D permeation rate through a 8 mm thick W with a pristine surface is estimated to be 8.1 × 1018 D m s−1 under the incident ion flux of 1 × 1024 m−2 s−1 and temperature of 1173 K.

中文翻译：

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等离子驱动渗透测定钨表面的氘复合系数

摘要 钨 (W) 样品的氘 (D) 等离子体驱动渗透 (PDP) 实验是通过线性射频 (RF) 等离子体装置进行的。在 PDP 实验中，W 样品表面垂直于晶粒伸长方向。D 离子通量约为 1021 m-2 s-1，由双朗缪尔探针确定。结果表明偏压对 D 等离子体驱动的渗透行为的影响有限。W 表面上的 D 复合系数是在 740 K 到 1031 K 的温度范围内获得的。原始 W 表面的实验测量复合系数低于干净的 W 表面的复合系数。通过氢同位素扩散和捕获（HIDT）模拟代码研究了复合系数对 W 中 D 渗透和保留行为的影响。低复合系数导致 W 中的高 D 浓度和背面的高渗透率。在 1 × 1024 m-2 s-1 的入射离子通量和 1173 K 的温度下，通过具有原始表面的 8 mm 厚 W 的 D 渗透率估计为 8.1 × 1018 D m s-1。