Abstract Non-evaporable getter (NEG) thin films provide distributed pumping properties, allowing to achieve ultrahigh vacuum in narrow and conductance limited chambers. It is an ideal solution to deal with the small aperture of vacuum chambers. In this paper, ternary Ti-Zr-V getter film with approximate equal atomic ratio was deposited on oxygen free copper (OFC) substrate by using a developed DC magnetron sputtering system with an alloy target. Microstructural characterization by scanning electron microscopy, atomic force microscopy and energy dispersive spectroscopy (EDX) indicates that the porous getter film exhibit a columnar growth pattern and the grain sizes are very distributed ranging from several up to hundreds of nanometres. The compositions and the corresponding chemical bonding states are analyzed by using in-situ synchrotron radiation X-ray photoelectron spectroscopy after activation for 1 h at different temperatures in ultra-high vacuum. The results indicate that Ti, Zr and V are initially in their high oxidized states, which are gradually reduced in steps to oxides of lower valence states and finally to their metallic states. The reduction of vanadium oxides is more preferable than that of titanium- and zirconium-oxides. Such activation commences at a temperature as low as 150 °C, and can be enhanced by increasing temperature.

中文翻译：

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磁控溅射沉积Ti-Zr-V吸气剂薄膜的活化表征

摘要 不可蒸发吸气剂 (NEG) 薄膜提供分布式泵送特性，允许在狭窄且电导受限的腔室中实现超高真空。是处理真空室小孔径的理想解决方案。在本文中，使用开发的直流磁控溅射系统和合金靶材，在无氧铜 (OFC) 衬底上沉积了具有近似相等原子比的三元 Ti-Zr-V 吸气剂膜。通过扫描电子显微镜、原子力显微镜和能量色散光谱 (EDX) 进行的微观结构表征表明，多孔吸气剂薄膜呈现柱状生长模式，晶粒尺寸分布非常广泛，从几纳米到几百纳米不等。在超高真空中在不同温度下活化1小时后，通过使用原位同步辐射X射线光电子能谱分析组成和相应的化学键合状态。结果表明，Ti、Zr 和 V 最初处于高氧化态，然后逐步还原为低价态的氧化物，最后还原为金属态。钒氧化物的还原比钛氧化物和锆氧化物的还原更优选。这种活化在低至 150 °C 的温度下开始，并且可以通过升高温度来增强。它们逐步还原为较低价态的氧化物，最后还原为金属态。钒氧化物的还原比钛氧化物和锆氧化物的还原更优选。这种活化在低至 150 °C 的温度下开始，并且可以通过升高温度来增强。它们逐步还原为较低价态的氧化物，最后还原为金属态。钒氧化物的还原比钛氧化物和锆氧化物的还原更优选。这种活化在低至 150 °C 的温度下开始，并且可以通过升高温度来增强。