Abstract At atmospheric pressure, dielectric barrier discharge of a mixture of nitrogen gas and n-hexane solution has been used to deposit N-DLC films on Pyrex glasses. The composition and the structure of the deposited films have been studied by FTIR and Raman spectra. The surface morphology of films is performed by analyses of FESEM, EDX, and AFM. According to the results of Raman spectra, the ID/IG ratio has been decreased, FWHM of G peak has been increased and the G peak position has been moved to lower wavenumbers. Based on obtained results, increasing electrical discharge power leads to increasing sp3 content and structural transition from the graphitized to amorphous structures. The sp3 content is related to C–H, C–C, and C–N bonds. With the more formation of C–C and C–N bonds than C–H bonds, mechanical properties of hardness and scratchability are strengthen while more increment of C–H bonds in the deposited films compared to two other bonds leads to decrease these properties. Discharge power increment leads to the changing of the adhesion strength as another the mechanical property due to the variation of the hydrogen content, the surface bonding rate, and penetration of the species to the substrate.

中文翻译：

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放电功率对常压DBD等离子体沉积N-DLC薄膜力学性能的影响

摘要 在大气压下，氮气和正己烷溶液的混合物的介质阻挡放电已被用于在 Pyrex 玻璃上沉积 N-DLC 薄膜。通过FTIR和拉曼光谱研究了沉积薄膜的组成和结构。薄膜的表面形态通过 FESEM、EDX 和 AFM 的分析进行。根据拉曼光谱的结果，ID/IG 比值已降低，G 峰的 FWHM 已增加，G 峰位置已移至较低波数。根据获得的结果，增加放电功率导致增加 sp3 含量和从石墨化结构到非晶结构的结构转变。sp3 含量与 C–H、C–C 和 C–N 键有关。由于 C-C 和 C-N 键的形成多于 C-H 键，硬度和可刮擦性的机械性能得到加强，而与其他两种键相比，沉积膜中 C-H 键的更多增量导致这些性能降低。由于氢含量、表面结合率和物质对基材的渗透的变化，放电功率的增加导致作为另一个机械性能的粘附强度的变化。