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Plasmon-Enhanced Resonant Photoemission Using Atomically Thick Dielectric Coatings.
ACS Nano ( IF 17.1 ) Pub Date : 2020-06-22 , DOI: 10.1021/acsnano.0c03406
Xiao Xiong 1 , Yang Zhou 2 , Yi Luo 2 , Xiang Li 3 , Michel Bosman 4, 5 , Lay Kee Ang 6 , Peng Zhang 2 , Lin Wu 1
Affiliation  

By proposing an atomically thick dielectric coating on a metal nanoemitter, we theoretically show that the optical field tunneling of ultrafast-laser-induced photoemission can occur at an ultralow incident field strength of 0.03 V/nm. This coating strongly confines plasmonic fields and provides secondary field enhancement beyond the geometrical plasmon field enhancement effect, which can substantially reduce the barrier and enable more efficient photoemission. We numerically demonstrate that a 1 nm thick layer of SiO2 around a Au-nanopyramid will enhance the resonant photoemission current density by 2 orders of magnitude, where the transition from multiphoton absorption to optical field tunneling is accessed at an incident laser intensity at least 10 times lower than that of the bare nanoemitter. The effects of the coating properties such as refractive index, thickness, and geometrical settings are studied, and tunable photoemission is numerically demonstrated by using different ultrafast lasers. Our approach can also directly be extended to nonmetal emitters, to—for example—2D material coatings, and to plasmon-induced hot carrier generation.

中文翻译:

使用原子厚的介电涂层的等离子体增强共振光发射。

通过在金属纳米发射体上建议原子厚的介电涂层,我们从理论上表明,超快激光诱导的光发射的光隧道效应可以在0.03 V / nm的超低入射场强度下发生。该涂层强烈地限制了等离子体场,并提供了超出几何等离子体场增强作用的二次场增强,这可以大大减少势垒并实现更有效的光发射。我们通过数值证明了1 nm厚的SiO 2围绕金纳米金字塔将共振光发射电流密度提高2个数量级,其中从多光子吸收到光场隧穿的跃迁是在入射激光强度至少比裸纳米发射体低10倍的情况下进行的。研究了诸如折射率,厚度和几何设置等涂层特性的影响,并通过使用不同的超快激光在数值上证明了可调光发射。我们的方法也可以直接扩展到非金属发射体,例如2D材料涂层,以及等离激元诱导的热载流子生成。
更新日期:2020-07-28
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