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Depth profiling by pulsed glow discharge time-of-flight mass spectrometry with a combined hollow cathode cell
Journal of Analytical Atomic Spectrometry ( IF 3.4 ) Pub Date : 2020-06-19 , DOI: 10.1039/d0ja00088d
Anna Gubal 1, 2, 3, 4 , Victoria Chuchina 1, 2, 3, 4 , Yegor Lyalkin 1, 2, 3, 4 , Vladimir Mikhailovskii 1, 2, 3, 4 , Viktor Yakobson 4, 5, 6 , Nikolay Solovyev 1, 2, 3, 4, 7 , Alexander Ganeev 1, 2, 3, 4, 8
Affiliation  

A combined hollow cathode microsecond direct current pulsed glow discharge time-of-flight mass spectrometry (CHC μs-DC-PGD TOFMS) system has proved its efficiency for quantification; however, it has not been properly tested for the purpose of depth analysis until now, to the best of the authors' knowledge. The aim of the current study was to investigate the capabilities of this glow discharge source type for depth profiling. Special attention was paid to the alteration of depth resolution during the sputtering and the effect of discharge parameters on the crater shape in different types of solid samples. Both dielectric and conductive samples were tested, including: a Ni film on silicon, a Si film on borosilicate glass, and IR-reflective dielectric multilayer (mirror) coatings. Crater shapes were investigated after combined hollow cathode cell sputtering to ensure reliable profiling. For dielectric materials, including multilayer coatings, the deposition of a thin conducting layer (Ag or Ta) on the sample surface was demonstrated to result in reliable sputtering with adequate depth resolution of the profiling. This preliminary sample coating provided both the formation of required surface conductivity and reduction of the negative effect of atmospheric gases and water surface contamination at the beginning of sample sputtering. A silicon-coated borosilicate glass specimen was tested for potential quantitative profiling, showing promising results. The CHC μs-DC-PGD TOFMS system used was capable of analyzing the layers of varied thickness in the range from tens of nanometers to several micrometers. The depth resolution was 5 nm and 25 nm for conducting and dielectric layers, respectively.

中文翻译:

组合空心阴极池的脉冲辉光放电飞行时间质谱深度分析

组合的空心阴极微秒直流脉冲辉光放电飞行时间质谱(CHCμs-DC-PGDTOFMS)系统证明了其定量的效率。然而,据作者所知,到目前为止,尚未针对深度分析的目的对其进行适当的测试。当前研究的目的是研究这种辉光放电源类型进行深度剖析的能力。特别注意溅射过程中深度分辨率的变化以及放电参数对不同类型固体样品中弹坑形状的影响。测试了电介质和导电样品,包括:硅上的Ni膜,硼硅酸盐玻璃上的Si膜以及IR反射型电介质多层(镜面)涂层。结合空心阴极电池溅射后研究了坑的形状,以确保可靠的轮廓分析。对于包括多层涂层在内的介电材料,已证明在样品表面上沉积薄导电层(Ag或Ta)可产生可靠的溅射,并具有足够的轮廓深度分辨率。这种初始的样品涂层既可以形成所需的表面电导率,又可以减少样品溅射开始时大气气体和水表面污染的负面影响。对涂硅的硼硅酸盐玻璃样品进行了潜在的定量分析,结果令人满意。所用的CHCμs-DC-PGDTOFMS系统能够分析厚度范围从几十纳米到几微米的层。
更新日期:2020-08-10
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