Abstract In the present work we studied the mechanical properties of hafnium dioxide (HfO2) and aluminium oxide (Al2O3) thin films deposited on glass at low temperature by means of atomic layer deposition method. The scratch resistance and tribological properties of HfO2 and Al2O3 were investigated. During scratch tests the first small cracks in the films were detected with a relatively low load of 3.4–4.9 N. However, up to a load of 30 N, crushing, cracking, and delamination of the Al2O3/glass system not occurs. The tribological experiments revealed a significant difference in the wear between the HfO2 and Al2O3 films. The microcrystalline structure observed for HfO2 resulted in better tribological properties than the Al2O3 film. The addition of a thin zinc oxide interlayer significantly improved the mechanical properties of the system with HfO2 film.

中文翻译：

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通过原子层沉积在玻璃基板上生长的二氧化铪和氧化铝薄膜的摩擦学研究

摘要 在目前的工作中，我们通过原子层沉积方法研究了低温沉积在玻璃上的二氧化铪 (HfO2) 和氧化铝 (Al2O3) 薄膜的机械性能。研究了 HfO2 和 Al2O3 的抗划伤性和摩擦学性能。在划痕测试期间，在 3.4-4.9 N 的相对较低的负载下检测到薄膜中的第一个小裂缝。然而，在高达 30 N 的负载下，Al2O3/玻璃系统不会发生压碎、开裂和分层。摩擦学实验表明 HfO2 和 Al2O3 薄膜之间的磨损存在显着差异。观察到的 HfO2 微晶结构比 Al2O3 薄膜具有更好的摩擦学性能。