Nanopositioning stage, based on the stick–slip principle, is a hot research topic due to its unparallel merits such as compact structure, high resolution, and long travel stroke. However, most of the conventional stick–slip nanopositioning stages only have the ability to move along the horizontal directions. In addition, analysis of vertical stage movement is few. This paper proposes a novel stick–slip nanopositioning stage capable of moving upwards and downwards with an excellent performance. An adjusting unit was developed and integrated into the stage to effectively change friction force which is the key to the vertical stage movement. Theoretical and numerical analysis show that many parameters including revised driving signal contributes to the upward movement of stick–slip nanopositioning stage. Experimental results show that the stage has the capability of traveling up to 22 mm with an upward positioning accuracy of 7.00 nm and a downward positioning accuracy of 5.00 nm, respectively. The maximum speed for maximum speeds of stage for upward and downward motion were measured to be 2.70 and 0.77 mm/s, respectively. The maximum load of stage in vertical direction is 72 g. This stage design has a huge potential in applications requiring vertical manipulation while requiring nanometer positioning accuracies, high travel stroke, compact structure, and large load.

基于粘滑原理的纳米定位平台由于其无与伦比的优点（如结构紧凑，分辨率高和行程长）而成为研究热点。但是，大多数传统的粘滑纳米定位平台仅具有沿水平方向移动的能力。另外，对垂直舞台运动的分析很少。本文提出了一种新颖的粘滑纳米定位平台，该平台能够上下移动并具有出色的性能。开发了一个调节单元并将其集成到平台中，以有效地改变摩擦力，这是垂直平台运动的关键。理论和数值分析表明，许多参数（包括修正的驱动信号）有助于粘滑纳米定位平台的向上运动。实验结果表明，该载物台能够移动至22 mm，向上定位精度为7.00 nm，向下定位精度为5.00 nm。平台向上和向下运动的最大速度的最大速度分别为2.70和0.77 mm / s。平台在垂直方向上的最大负载为72 g。该平台设计在需要垂直操纵，同时要求纳米定位精度，高行程，紧凑结构和大负载的应用中具有巨大潜力。平台在垂直方向上的最大负载为72 g。该平台设计在需要垂直操纵，同时要求纳米定位精度，高行程，紧凑结构和大负载的应用中具有巨大潜力。平台在垂直方向上的最大负载为72 g。该平台设计在需要垂直操纵，同时要求纳米定位精度，高行程，紧凑结构和大负载的应用中具有巨大潜力。