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In situ growth of benzothiadiazole functionalized UiO-66-NH2 on carboxyl modified g-C3N4 for enhanced photocatalytic degradation of sulfamethoxazole under visible light
Catalysis Science & Technology ( IF 5 ) Pub Date : 2020-06-16 , DOI: 10.1039/d0cy01019g
Shi-Wen Lv 1, 2, 3, 4, 5 , Jing-Min Liu 2, 3, 4, 5, 6 , Chun-Yang Li 2, 3, 4, 5, 6 , Ning Zhao 2, 3, 4, 5, 6 , Zhi-Hao Wang 2, 3, 4, 5, 6 , Shuo Wang 1, 2, 3, 4, 5
Affiliation  

Developing low-cost and high-performance photocatalysts is significant for environmental protection but still remains challenging. Herein, a list of UiO-66-NH-BT@g-C3N4 composites decorated with electron deficient units were first constructed through a simple step-by-step in situ growth strategy, and the obtained hybrid photocatalysts (denoted as UiO-66-NH-BT@g-C3N4) were then employed as an efficient mediator to activate peroxydisulfate in order to degrade typical antibiotics. Obviously, embedding carboxyl groups on the surface of g-C3N4 would provide a good environment for the growth of UiO-66-NH-BT, while the introduction of benzothiadiazole could effectively facilitate the separation and transfer of charge carriers. Furthermore, the formation of an n–n heterojunction interface between g-C3N4 and UiO-66-NH-BT could further promote charge transfer. As expected, the UiO-66-NH-BT@g-C3N4-2 hybrid photocatalysts showed great photocatalytic activity in SMX degradation, with the highest removal efficiency of 97.6%. A possible photocatalytic mechanism was also proposed. More importantly, the UiO-66-NH-BT@g-C3N4-2 composite with excellent stability can efficiently remove other antibiotics (e.g., TC, OFX, DFC and IBP) in a very short period of time. In short, the current work has not only developed a promising system (namely the UiO-66-NH-BT@g-C3N4-2/PS/solar system) for the removal of contaminants, but has also shared a novel strategy to synthesize a highly-efficient photocatalyst.

中文翻译:

苯并噻二唑官能化的UiO-66-NH2在羧基修饰的g-C3N4上的原位生长,以增强可见光下磺胺甲恶唑的光催化降解

开发低成本和高性能的光催化剂对环境保护具有重要意义,但仍具有挑战性。在此,首先通过简单的分步原位生长策略构建了用缺电子单元修饰的UiO-66-NH-BT @ gC 3 N 4复合材料列表,并获得了杂化光催化剂(称为UiO-66然后将-NH-BT @ gC 3 N 4)用作活化过氧二硫酸盐的有效介质,以降解典型的抗生素。显然,在gC 3 N 4的表面嵌入了羧基为UiO-66-NH-BT的生长提供了良好的环境,而苯并噻二唑的引入可以有效地促进电荷载流子的分离和转移。此外,在gC 3 N 4和UiO-66-NH-BT之间形成n–n异质结界面可以进一步促进电荷转移。不出所料,UiO-66-NH-BT @ gC 3 N 4 -2杂化光催化剂在SMX降解中表现出了良好的光催化活性,最高去除率为97.6%。还提出了一种可能的光催化机理。更重要的是,具有出色稳定性的UiO-66-NH-BT @ gC 3 N 4 -2复合材料可以有效去除其他抗生素(例如,TC,OFX,DFC和IBP)。简而言之,当前的工作不仅开发了用于去除污染物的有前途的系统(即UiO-66-NH-BT @ gC 3 N 4 -2 / PS /太阳能系统),而且还分享了一种新颖的策略合成高效的光催化剂。
更新日期:2020-07-21
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