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Ferroelectric domain wall memory with embedded selector realized in LiNbO3 single crystals integrated on Si wafers.
Nature Materials ( IF 41.2 ) Pub Date : 2020-06-15 , DOI: 10.1038/s41563-020-0702-z
An Quan Jiang 1 , Wen Ping Geng 2 , Peng Lv 3 , Jia-Wang Hong 3 , Jun Jiang 1 , Chao Wang 1 , Xiao Jie Chai 1 , Jian Wei Lian 1 , Yan Zhang 1 , Rong Huang 4 , David Wei Zhang 1 , James F Scott 5 , Cheol Seong Hwang 6
Affiliation  

Interfacial ‘dead’ layers between metals and ferroelectric thin films generally induce detrimental effects in nanocapacitors, yet their peculiar properties can prove advantageous in other electronic devices. Here, we show that dead layers with low Li concentration located at the surface of LiNbO3 ferroelectric materials can function as unipolar selectors. LiNbO3 mesa cells were etched from a single-crystal LiNbO3 substrate, and Pt metal contacts were deposited on their sides. Poling induced non-volatile switching of ferroelectric domains in the cell, and volatile switching in the domains in the interfacial (dead) layers, with the domain walls created within the substrate being electrically conductive. These features were also confirmed using single-crystal LiNbO3 thin films bonded to SiO2/Si wafers. The fabricated nanoscale mesa-structured memory cell with an embedded interfacial-layer selector shows a high on-to-off ratio (>106) and high switching endurance (~1010 cycles), showing potential for the fabrication of crossbar arrays of ferroelectric domain wall memories.



中文翻译:

具有嵌入选择器的铁电畴壁存储器以集成在Si晶片上的LiNbO3单晶实现。

金属和铁电薄膜之间的界面“死”层通常会在纳米电容器中引起有害的影响,但是它们的独特性能在其他电子设备中却可以证明是有利的。在这里,我们表明位于LiNbO 3铁电材料表面的具有低Li浓度的死层可以用作单极选择器。从单晶LiNbO 3蚀刻LiNbO 3台面电池衬底,并在其侧面沉积Pt金属触点。极化引起单元中铁电畴的非易失性切换,以及界面(死)层中畴的易失性切换,并且在基板内创建的畴壁是导电的。使用结合到SiO 2 / Si晶片的单晶LiNbO 3薄膜也证实了这些特征。带有嵌入式界面层选择器的纳米级台面结构存储单元显示出高的通断比(> 10 6)和高的开关耐力(〜10 10循环),显示了制造铁电交叉开关阵列的潜力域墙的回忆。

更新日期:2020-06-15
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