Enhanced optical spectral resolution is of great interest for sensor technology applications. One-dimensional scanners are commonly used for spectral imaging, and there is increased interest in 2D spectral imagers. The later are not easy to achieve, since single channel pixels need to be very small and creating an arbitrary filter of pixel size is not trivial. Here we present a single mask etch step using grayscale lithography enabling Fabry-Perot type filters for sub-pixel pitch smaller than 5 μm.

中文翻译：

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用于光谱分辨成像仪的 Fabry-Pérot 标准具的单掩模步进蚀刻

增强的光学光谱分辨率对传感器技术应用非常重要。一维扫描仪通常用于光谱成像，人们对二维光谱成像仪的兴趣也在增加。后者不容易实现，因为单通道像素需要非常小，并且创建像素大小的任意过滤器并非易事。在这里，我们展示了使用灰度光刻的单个掩模蚀刻步骤，使 Fabry-Perot 型滤波器能够实现小于 5 μm 的子像素间距。