Abstract—

The electrochemical properties of Ti–Al–Mo–Ni–N coatings with a molybdenum content of 20 and 25 at % fabricated by cathodic arc deposition (Arc-PVD) are studied. Series 2 coatings are characterized by the presence of Mo in both a chemically bound (Mo₂N, as with series 1 coatings) and free states (i.e., metallic phase). Considering the multilayer architecture of coatings based on the mixed nitride (TiAl)N and molybdenum-containing phases, their corrosion destruction proceeds layer by layer due to different corrosion resistance of these phases in acidic and alkaline environments. Annealing the coatings at 600°C in vacuum gives rise to diffusional processes in them that lead to a growth of crystallites of the (TiAl)N nitride phase and a decrease in the microstrain. This phenomenon is considerably more conspicuous in series 2 coatings, which can be explained by the higher diffusivity of Mo atoms in the metallic phase than in the case of their counterparts in the nitride phase.

中文翻译：

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Arc-PVD制备的Ti-Al-Mo-Ni-N涂层的热稳定性和电化学性能

摘要—

研究了通过阴极电弧沉积（Arc-PVD）制备的钼含量为20和25 at％的Ti-Al-Mo-Ni-N涂层的电化学性能。系列2涂层的特征是在化学键合（Mo ₂N，与系​​列1涂层一样）和自由态（即金属相）。考虑到基于混合氮化物（TiAl）N和含钼相的涂层的多层结构，由于这些相在酸性和碱性环境中的耐腐蚀性不同，因此它们的腐蚀破坏逐层进行。在真空中于600°C对涂层进行退火会导致涂层中的扩散过程，从而导致（TiAl）N氮化物相的微晶生长和微应变降低。这种现象在系列2涂层中更为明显，这可以用金属原子中的Mo原子比氮化物中的对应原子更高的扩散率来解释。