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Room temperature direct patterning of nanocrystalline zinc oxide on flexible polymer substrates through vacuum ultraviolet light irradiation
Thin Solid Films ( IF 2.1 ) Pub Date : 2020-09-01 , DOI: 10.1016/j.tsf.2020.138166
Ahmed I.A. Soliman , Cheng-Tse Wu , Toru Utsunomiya , Takashi Ichii , Hiroyuki Sugimura

Abstract This paper describes a 172-nm vacuum ultraviolet (VUV) light treatment in ambient air towards the formation of nanocrystalline zinc oxide (ZnO) micropatterns. Thin layers of zinc acetate (Zn(OAc)2) as a precursor are spun on substrates, and subsequently treated by the VUV irradiation. The VUV treatments lead to an organic-free ZnO films with wurtzite crystalline structures, determined by Fourier transform infrared spectroscopy, X-ray photoelectron spectroscopy and transmission electron microscopy. The nanocrystalline ZnO patterns with a fine feature of 1 μm are fabricated on cycloolefin polymer (COP) substrates via the precise VUV lithography. This one-step ZnO crystallizing and patterning process is suited for polymer substrates because the potentially damaging procedures involving acidic etchants and thermal treatments are no longer needed. The present method proves to be a simple, effective, controllable patterning approach, which might be recommended for the future fabrication of flexible devices.

中文翻译:

通过真空紫外光照射在柔性聚合物基板上室温直接图案化纳米晶氧化锌

摘要 本文描述了在环境空气中进行 172 nm 真空紫外 (VUV) 光处理,以形成纳米晶氧化锌 (ZnO) 微图案。作为前体的醋酸锌薄层 (Zn(OAc)2) 在基板上旋转,然后通过 VUV 照射进行处理。通过傅里叶变换红外光谱、X 射线光电子能谱和透射电子显微镜测定,真空紫外线处理产生具有纤锌矿晶体结构的不含有机物的 ZnO 薄膜。通过精确的 VUV 光刻在环烯烃聚合物 (COP) 基板上制造具有 1 μm 精细特征的纳米晶 ZnO 图案。这种一步法 ZnO 结晶和图案化工艺适用于聚合物基材,因为不再需要涉及酸性蚀刻剂和热处理的潜在破坏性程序。本方法被证明是一种简单、有效、可控的图案化方法,可推荐用于未来柔性器件的制造。
更新日期:2020-09-01
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