A new chamber for material analysis and modification using energetic ions with primary particle energies in the keV regime was developed at the single stage 350 kV high-current Danfysik implanter at the Tandem Laboratory, Uppsala University. The experimental set-up allows for ¹¹B and ¹⁸O depth profiling by Nuclear Reaction Analysis using the ¹¹B(p,α₀)⁸Be and ¹⁸O(p,α)¹⁵N nuclear resonances at 163 keV and at 151 keV, respectively. Additionally, a surface barrier detector with a cryogenic assembly enables High-Resolution Backscattering Spectrometry with average resolution ≈4 keV FWHM for protons. A silicon drift detector enables Low-Energy Particle Induced X-ray Emission analysis for elements with low atomic number (Z ≥ 8). The available instrumentation of the chamber assembly with its specifications are described in details with a series of applied and fundamental benchmark studies, together with some suggestions for future applications.

在Uppsala大学Tandem实验室的单级350 kV大电流Danfysik注入机上，开发了一种新的腔室，用于在keV态下使用具有初级粒子能量的高能离子进行材料分析和改性。实验设置允许使用¹¹ B（p，_α0）⁸ Be和¹⁸ O（p，α）¹⁵通过核反应分析进行¹¹ B和¹⁸ O深度剖析分别在163 keV和151 keV的N个核共振。此外，具有低温组件的表面势垒探测器可实现质子的平均分辨率约为4 keV FWHM的高分辨率反向散射光谱分析。硅漂移检测器可对低原子序数（Z≥8）的元素进行低能粒子诱导X射线发射分析。腔室组件的可用仪器及其规格将通过一系列应用和基础基准研究进行详细描述，并针对未来的应用提出一些建议。