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Effect of vacuum annealing on the structural and optical properties of sputtered Cu4O3 thin films
Surface Engineering ( IF 2.8 ) Pub Date : 2020-04-29 , DOI: 10.1080/02670844.2020.1753397
L. Radjehi 1 , L. Aissani 2 , A. Djelloul 1 , S. Lamri 3 , K. Nomenyo 4 , S. Achache 3 , G. Lerondel 4 , F. Sanchette 3, 5
Affiliation  

Cu4O3 thins films were deposited by the reactive magnetron sputtering process on glass and Si (100) wafers. In order to investigate the thermal stability of the Cu4O3 phase, the films were subjecte...

中文翻译:

真空退火对溅射Cu4O3薄膜结构和光学性能的影响

Cu4O3 薄膜通过反应磁控溅射工艺沉积在玻璃和 Si (100) 晶片上。为了研究 Cu4O3 相的热稳定性,对薄膜进行了...
更新日期:2020-04-29
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