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Microstructure and properties of nanocrystalline Cu–Ta thin films prepared by direct current magnetron sputtering
Surface Engineering ( IF 2.8 ) Pub Date : 2020-04-10 , DOI: 10.1080/02670844.2020.1748338 Wu Tian 1, 2 , Jiaoyan Dai 2 , Lijun Zhang 2, 3 , Yongqiang Chang 2, 4 , Mingdong Bao 2 , Shengwang Yu 1
Surface Engineering ( IF 2.8 ) Pub Date : 2020-04-10 , DOI: 10.1080/02670844.2020.1748338 Wu Tian 1, 2 , Jiaoyan Dai 2 , Lijun Zhang 2, 3 , Yongqiang Chang 2, 4 , Mingdong Bao 2 , Shengwang Yu 1
Affiliation
Nanocrystalline (NC) Cu–Ta thin films were successfully fabricated by unbalanced magnetron sputtering on crystal silicon and glass substrates. Thin films doped with different Ta contents were prepa...
中文翻译：
直流磁控溅射制备纳米晶Cu-Ta薄膜的组织与性能
通过在晶体硅和玻璃基板上的非平衡磁控溅射成功地制造了纳米晶 (NC) Cu-Ta 薄膜。制备了不同Ta含量掺杂的薄膜...
更新日期：2020-04-10
中文翻译：
直流磁控溅射制备纳米晶Cu-Ta薄膜的组织与性能
通过在晶体硅和玻璃基板上的非平衡磁控溅射成功地制造了纳米晶 (NC) Cu-Ta 薄膜。制备了不同Ta含量掺杂的薄膜...
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