In this paper, the ground state number densities of titanium atom and ion, ionised density fraction and ionised flux fraction were determined in a high power impulse magnetron sputtering process. Three regions of interest within the deposition chamber were studied; the magnetised plasma region, middle region, and substrate region. Pulse length and applied power were kept constant and working pressure and duty cycle were varied. The effective branching fractions method was utilised to evaluate the number densities of sputtered species from a measured optical emission signal. A biasable quartz crystal microbalance system was used to evaluate the ionised flux fraction and deposition rate. The highest ionised density fraction of 90% was reached in the target region for 1.2% duty cycle and it was mostly independent on working pressure. Moving from the target, the ionised density fraction was observed to decrease. In the substrate region for a duty cycle below 2% and the whole studied...

中文翻译：

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HiPIMS中靶材和衬底区域的溅射钛物种的电离分数

本文通过大功率脉冲磁控溅射工艺确定了钛原子和离子的基态数密度，电离密度分数和电离通量分数。研究了沉积室内三个感兴趣的区域；磁化等离子体区域，中间区域和基板区域。脉冲长度和施加的功率保持恒定，并且工作压力和占空比变化。有效的分支分数法被用于从测得的光发射信号评估溅射物种的数量密度。使用可偏置的石英晶体微天平系统评估电离的通量分数和沉积速率。在1.2％的占空比下，目标区域中的最高电离密度分数达到了90％，并且大部分与工作压力无关。从目标移开，观察到电离的密度分数降低。在衬底区域中，占空比低于2％，整个研究过程都...