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Study of (Ti,Zr)C:H/a-C:H nanocomposite thin film formation by low temperature reactive high power impulse magnetron sputtering
Surface & Coatings Technology ( IF 5.4 ) Pub Date : 2020-05-23 , DOI: 10.1016/j.surfcoat.2020.125958
Christian Poltorak , Michael Stüber , Harald Leiste , Andreas Bergmaier , Sven Ulrich

Single-phase nanocrystalline hydrogen-containing titanium zirconium carbide thin films and hydrogen-containing nanocomposite thin films consisting of a nanocrystalline hydrogen-containing titanium zirconium carbide phase in combination with an amorphous hydrogen-containing carbon network, (Ti1-xZrx)C1-δ:H/a-C:H, were deposited by low temperature reactive high power impulse magnetron sputtering (HiPIMS) in a methane-argon atmosphere. High power impulse magnetron sputtering offers a high degree of ionization of sputtered particles and therefore a precise control of the thin film growth. The thin film deposition in the Ti-Zr-C-H system was carried out by a combinatorial approach via the variation of both the titanium-to-zirconium ratio as well as the carbon and hydrogen content in the coatings. A single, metallic, segmented target consisting of two triangles of pure titanium and zirconium enabled the deposition of thin films with different titanium-to‑zirconium-ratio dependent of the substrate position in front of the target within one deposition process. By variation of the CH4 reactive gas flow at a constant Argon gas flow the carbon and hydrogen content of individual thin films was precisely adjusted. During the HiPIMS process a short pulse time of 50 μs was combined with a comparably low duty cycle of 3.3% in order to ensure a high ionization. In order to investigate the chemical composition of the thin films including hydrogen content electron probe microanalysis was combined in a self-consistent way with elastic recoil detection analysis. Structural analysis was done by a combination of different techniques: Raman spectroscopy suggests metal‑carbon bonds attributable to a nanocrystalline metal carbide phase as well as the formation of an amorphous hydrogen-containing carbon network. X-ray diffraction shows fcc (Ti1-xZrx)C1-δ:H grains with different sizes in all coatings. Transmission electron microscopy confirms the structure model of single phase nanocrystalline (Ti1-xZrx)C1-δ:H grains embedded in a hydrogen-containing amorphous carbon matrix. Scope of this work is the low temperature deposition of the (Ti,Zr)C1-δ:H thin films and the (Ti,Zr)C1-δ:H/a-C:H nanocomposites by HiPIMS with precise control of the resulting chemical composition and microstructure.



中文翻译:

低温反应性大功率脉冲磁控溅射形成(Ti,Zr)C:H / aC:H纳米复合薄膜的研究

(Ti 1-x Zr x)C单相纳米晶含氢钛锆碳化物薄膜和由纳米晶含氢钛锆碳化物相与无定形含氢碳网络组成的含氢纳米复合薄膜1-δ通过在甲烷-氩气气氛中的低温反应性高功率脉冲磁控溅射(HiPIMS)沉积:: H / aC:H。高功率脉冲磁控溅射可提供溅射粒子的高度电离,因此可精确控制薄膜的生长。Ti-Zr-CH系统中的薄膜沉积是通过组合方法通过改变钛与锆的比例以及涂层中碳和氢含量的方式进行的。由两个纯钛和锆的三角形组成的单个金属分段靶材,可以在一个沉积过程中沉积不同钛对锆比的薄膜,取决于靶材在靶材前方的衬底位置。通过CH 4的变化在恒定氩气流量下的反应气体流量中,精确调节了各个薄膜的碳和氢含量。在HiPIMS过程中,将50μs的短脉冲时间与3.3%的较低占空比组合在一起,以确保高电离。为了研究包括氢含量在内的薄膜的化学组成,将电子探针显微分析以自洽的方式与弹性反冲检测分析相结合。结构分析是通过不同技术的组合完成的:拉曼光谱表明,金属-碳键可归因于纳米晶体的金属碳化物相以及无定形的含氢碳网络的形成。X射线衍射显示fcc(Ti 1-x Zr x)C1 :H颗粒在所有涂层中具有不同的尺寸。透射电子显微镜证实了嵌入含氢的无定形碳基体中的单相纳米晶(Ti 1-x Zr x)C1 :H晶粒的结构模型。这项工作的范围是通过HiPIMS对(Ti,Zr)C1 :H薄膜和(Ti,Zr)C1 :H / aC:H纳米复合材料进行低温沉积,并精确控制所得结果化学成分和微观结构。

更新日期:2020-05-23
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