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A 0.18 μm CMOS capacitor-less Low-Drop Out Voltage Regulator Compensated via the Bootstrap Flipped-Voltage Follower
Microelectronics Journal ( IF 2.2 ) Pub Date : 2020-05-17 , DOI: 10.1016/j.mejo.2020.104809
Gregorio Zamora-Mejia , Dario Edwin Gomez-Garcia , Huber Giron-Nieto , Jaime Martinez-Castillo , Luis Armando Moreno-Coria , Jose Miguel Rocha-Perez , Alejandro Diaz-Sanchez

This work presents a Cap-less Low-Drop Out (LDO) Voltage Regulator that uses a Bootstrap Flipped-Voltage Follower (B-FVF) as the input stage of its active compensation network. Previous works use active compensation networks whose frequency response shows a high-pass behavior that depends on their compensation capacitor Cf. The dominant pole is related to the value of Cf. By using the B-FVF, this Cf-pole dependency is broken; only the gain of the compensation loop lies on Cf, while the high-pass pole is referred to the B-FVF input node capacitance. This advantage allows the integration of a smaller Cf, a 10X reduction compared with the state-of-the-art, and easier placement of the high-pass pole to higher frequencies than the LDO open-loop Gain Bandwidth (GBW). The proposed LDO presents a quiescent current consumption of 95 μA at a 1.8 V input voltage, delivering a 0mA–50mA load current at a 1.6 V output voltage. A load and line transient responses of 133 mV and 165 mV were measured by using a Cf of only 0.3 pF and a load capacitor CL of 100 pF. In order to validate the proposed LDO, simulations and measurements were performed in 0.18 μm CMOS Standard technology. The silicon area consumption is 0.133 mm2.



中文翻译:

一个0.18μm的无CMOS电容器的低压降稳压器,通过自举翻转电压跟随器进行补偿

这项工作提出了一种无帽低压降(LDO)稳压器,该稳压器使用自举翻转电压跟随器(B-FVF)作为其有源补偿网络的输入级。先前的工作使用有源补偿网络,该有源补偿网络的频率响应显示出取决于其补偿电容器C f的高通行为。主导极点与C f的值有关。通过使用B-FVF,此C f极相关性被打破;只有补偿环路的增益位于C f上,而高通极点称为B-FVF输入节点的电容。这一优势允许集成更小的C f,与最新技术相比降低了10倍,并且比LDO开环增益带宽(GBW)更容易将高通极放置于更高的频率。拟议的LDO在1.8 V输入电压下的静态电流消耗为95μA,在1.6 V输出电压下提供0mA–50mA的负载电流。通过仅使用0.3 pF的C f和100 pF的负载电容器C L可以测得133 mV和165 mV的负载和线路瞬态响应。为了验证所提出的LDO,在0.18μmCMOS标准技术中进行了仿真和测量。硅面积消耗为0.133mm 2

更新日期:2020-05-17
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