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Surface termination and Schottky-barrier formation of In4Se3(001)
Semiconductor Science and Technology ( IF 1.9 ) Pub Date : 2020-05-11 , DOI: 10.1088/1361-6641/ab7e45
Archit Dhingra 1 , Pavlo V Galiy 2 , Lu Wang 3 , Nataliia S Vorobeva 4 , Alexey Lipatov 4 , Angel Torres 4 , Taras M Nenchuk 2 , Simeon J Gilbert 1 , Alexander Sinitskii 4 , Andrew J Yost 5 , Wai-Ning Mei 6 , Keisuke Fukutani 1, 7 , Jia-Shiang Chen 8 , Peter A Dowben 1
Affiliation  

The surface termination of In4Se3(001) and the interface of this layered trichalcogenide, with Au, was examined using x-ray photoemission spectroscopy. Low energy electron diffraction indicates that the surface is highly crystalline, but suggests an absence of C2v mirror plane symmetry. The surface termination of the In4Se3(001) is found, by angle-resolved x-ray photoemission spectroscopy, to be In, which is consistent with the observed Schottky barrier formation found with this n-type semiconductor. Transistor measurements confirm earlier results from photoemission, suggesting that In4Se3(001) is an n-type semiconductor, so that Schottky barrier formation with a large work function metal, such as Au, is expected. The measured low carrier mobilities could be the result of the contacts and would be consistent with Schottky barrier formation.



中文翻译:

In 4 Se 3 (001) 的表面终止和肖特基势垒形成

In 4 Se 3 (001)的表面终止和这种层状三硫属化物与 Au 的界面使用 X 射线光电子能谱进行了检查。低能电子衍射表明表面是高度结晶的,但表明不存在 C 2v镜面对称性。In 4 Se 3 (001)的表面终止,通过角分辨 X 射线光电子发射光谱发现,是 In,这与观察到的肖特基势垒形成在这种 n 型半导体中发现的一致。晶体管测量证实了光发射的早期结果,表明 In 4 Se 3(001) 是 n 型半导体,因此可以预期形成具有大功函数金属(例如 Au)的肖特基势垒。测得的低载流子迁移率可能是接触的结果,并且与肖特基势垒形成一致。

更新日期:2020-05-11
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