Optimizing the deposition rate and ionized flux fraction by tuning the pulse length in high power impulse magnetron sputtering,Plasma Sources Science and Technology

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Optimizing the deposition rate and ionized flux fraction by tuning the pulse length in high power impulse magnetron sputtering
Plasma Sources Science and Technology ( IF 3.8 ) Pub Date : 2020-05-11 , DOI: 10.1088/1361-6595/ab8175
Martin Rudolph ₁ , Nils Brenning _{2,

3} , Michael A. Raadu ₂ , Hamidreza Hajihoseini ₄ , Jon Tomas Gudmundsson _{2,

4} , Andr Anders _{1,

5} , Daniel Lundin ₃

Affiliation

High power impulse magnetron sputtering (HiPIMS) is an ionized physical vapour deposition technique. While HiPIMS provides a high flux of metal ions to the substrate, the disadvantage is a reduced ...

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