Superconducting Nb₃Sn thin films have been produced on copper substrate by dc magnetron co-sputtering technique successfully. XRD and magnetic moment measurement demonstrate the exist of Nb₃Sn crystal. By changing the ratio between niobium target sputtering current to tin target, the tin concentration in different films is varied. However, the experiment results indicate critical temperature T_C of different Nb₃Sn thin film are nearly invariable while the composition of Nb-Sn of those are changed. Highest T_C of those films annealing at 650°C are around 12K, while 750°C annealing increase it to 15K. The SEM and element analysis results manifest inhomogenous distribution of tin atoms, where some tin islands appear over the film. The exist of tin-rich areas like tin islands is responsible for such particular performance of Nb₃Sn films.

采用直流磁控共溅射技术在铜基片上成功制备了超导Nb ₃ Sn薄膜。XRD和磁矩测量证明了Nb ₃ Sn晶体的存在。通过改变铌靶溅射电流与锡靶之间的比率，可以改变不同膜中的锡浓度。然而，实验结果表明，不同的Nb ₃ Sn薄膜的临界温度T _C几乎不变，而Nb ₃ Sn薄膜的组成却发生了变化。最牛逼_Ç在650°C退火的那些薄膜中，约有12K，而在750°C退火则增加到15K。SEM和元素分析结果表明锡原子分布不均匀，在薄膜上出现了一些锡岛。Nb ₃ Sn薄膜的这种特殊性能是造成锡岛等富锡区域的原因。