This study investigates the optimization of multilayer graphene (MLG) growth on Co–Ni/Al₂O₃ substrate. The MLG synthesized by chemical vapor deposition technique (CVD) was characterized using various instrument techniques. The surface area and pore volume of the MLG were estimated as ~ 642 m²/g and ~ 2.7 cm³/g, respectively. The Raman spectrometric analysis showed evidence of MLG. The effects of parameters such as temperature, Co–Ni composition and ethanol flow rate were investigated using response surface methodology (RSM) and central composite design. The maximum MLG yield of 77% was attained at optimum conditions of 800 °C, Co–Ni composition of 0.3/0.7 and ethanol flow rate of 11 ml/min. The analysis of variance (ANOVA) results showed that the RSM quadratic model is significant with a p value < 0.0001. The coefficient of determination (R²) values of 0.9694 revealed the reliability of the RSM model. The potential of CVD as a technique to synthesize MLG growth of a highly ordered crystallinity structure has been demonstrated in this study. The resulting MLG films are promising materials for the use in improving graphene-based electronics, sensing and energy devices.

这项研究研究了在Co-Ni / Al ₂ O ₃衬底上多层石墨烯（MLG）生长的优化。通过化学气相沉积技术（CVD）合成的MLG使用各种仪器技术进行了表征。MLG的表面积和孔体积估计约为642 m ² / g和2.7 cm ³/ g。拉曼光谱分析显示了MLG的证据。使用响应面方法（RSM）和中心复合设计研究了温度，Co-Ni组成和乙醇流速等参数的影响。在800°C的最佳条件下，Co-Ni组成为0.3 / 0.7，乙醇流速为11 ml / min时，最大MLG产率达到77％。方差分析（ANOVA）结果表明，RSM二次模型显着，p值<0.0001。测定系数（R ²）0.9694的值表明了RSM模型的可靠性。这项研究已经证明了CVD作为合成高度有序的结晶结构的MLG生长的技术的潜力。所得的MLG膜是有前途的材料，可用于改进基于石墨烯的电子，传感和能源设备。