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Issue Information
International Journal of Applied Glass Science ( IF 2.1 ) Pub Date : 2020-03-15 , DOI: 10.1111/ijag.13284


Cover Photograph: Contours of the predicted temperature and SiO2 concentrations in x‐z plane (at y = 0) for the cases with SiCl4 injection from the (A, D) first layer nozzle, (B, E) secondary layer nozzle and (C, F) fourth layer nozzle during fused silica glass synthesis by chemical vapor deposition. The nozzles are annular and arranged sequentially from the center of the burner to its outside. The analysis shows that the SiCl4 injection position has a small effect on flame temperature (see A‐C) due to the small heat release from the SiCl4 combustion. But great differences are found in the SiO2 concentration distributions. For SiCl4 injection from the first layer nozzle, SiO2 monomers are primarily concentrated in the centerline (see D). While a low‐high‐low SiO2 distribution is found along the radial direction from the centerline to the side when SiCl4 is injected from the fourth layer nozzle (see F), Uniform SiO2 distribution is found for SiCl4 injection from the secondary layer nozzle (see E). DOI: 10.1111/ijag.14771.
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中文翻译:

发行信息

封面照片:对于从(A,D)第一层喷嘴,(B,E)第二层喷嘴和(C,F)注入SiCl4的情况,在x-z平面(y = 0时)的预测温度和SiO2浓度的轮廓)在通过化学气相沉积法合成石英玻璃的过程中的第四层喷嘴。喷嘴是环形的,并且从燃烧器的中心到其外部依次排列。分析表明,由于SiCl4燃烧释放的热量少,SiCl4的注入位置对火焰温度的影响较小(请参阅A–C)。但是在SiO2浓度分布中发现了很大的差异。对于从第一层喷嘴注入的SiCl4,SiO2单体主要集中在中心线(请参阅D)。当从第四层喷嘴注入SiCl4时,从中心线到侧面沿径向方向出现了从高到低的SiO2分布(参见F),而从第二层喷嘴注入的SiCl4则发现了均匀的SiO2分布(参见F)。 E)。DOI:10.1111 / ijag.14771。
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更新日期:2020-03-15
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