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In-plane stress analysis of two nanoscale holes under surface tension
Archive of Applied Mechanics ( IF 2.8 ) Pub Date : 2020-02-20 , DOI: 10.1007/s00419-020-01672-9
Shuang Wang , Hai-Bing Yang , Cunfa Gao , Zengtao Chen

Studied in this paper is the surface tension-induced stress field around two nanoscale holes in an infinite, elastic matrix. The complex variable method is adopted to describe the assumed plane-strain deformation of the structure. The stress boundary conditions at the surfaces of the holes are formulated via the integral-type Gurtin–Murdoch model. The stress field is finally obtained with the aid of conformal mapping and series expansion methods. Numerical examples are demonstrated for the case of one approximately triangular, smooth hole and one approximately square, smooth hole. A detailed discussion is carried out about the influence of the distance between the two holes on the stress field.

中文翻译:

表面张力作用下两个纳米级孔的面内应力分析

本文研究的是无限弹性矩阵中两个纳米级孔周围的表面张力感应应力场。采用复变量法来描述结构的假定平面应变变形。孔表面的应力边界条件通过积分型Gurtin-Murdoch模型确定。最终借助共形映射和级数展开方法获得了应力场。对于一个近似三角形的光滑孔和一个近似正方形的光滑孔的情况,给出了数值示例。关于两个孔之间的距离对应力场的影响进行了详细的讨论。
更新日期:2020-02-20
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