A low frequency (100 kHz) ferromagnetic enhanced inductively coupled plasma (FMICP) source has been developed to obtain a large volume of dense Cl 2 /Ar plasma. The influence of chlorine addition on the FMICP parameters was investigated both experimentally and numerically using a global (volume averaged) model of Ar/Cl 2 discharge. Radial distributions of the positive ions flux as well as the values of FMICP voltage were measured at a fixed FMICP current of 10 A for molecular chlorine concentrations of 0–4 vol%. Plasma species densities were calculated for various values of chlorine content of 0–4 vol% and absorbed power of 500–2000 W. The calculations showed that chlorine ion density exceeds argon ion density even at low chlorine content of about 0.5 vol%. While experimentally measured discharge voltage and power increased almost linearly up to 3 times with chlorine addition, the experimental and numerical data on plasma density demonstrated only a weak depen...

中文翻译：

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大型铁磁增强Ar / Cl 2 ICP

已经开发了一种低频（100 kHz）铁磁增强感应耦合等离子体（FMICP）源，以获得大量的密集Cl 2 / Ar等离子体。使用Ar / Cl 2放电的整体（体积平均）模型，通过实验和数值研究了添加氯对FMICP参数的影响。在分子浓度为0–4 vol％的FMICP固定电流为10 A的情况下，测量了阳离子通量的径向分布以及FMICP电压的值。计算出氯含量为0–4 vol％的各种值和500–2000 W的吸收功率时的等离子体物质密度。计算结果表明，即使氯含量约为0.5 vol％，氯离子密度也超过了氩离子密度。