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Comparison of magnetron sputtering and ion beam sputtering on dispersive mirrors
Applied Physics B ( IF 2.1 ) Pub Date : 2020-04-15 , DOI: 10.1007/s00340-020-07431-6
Y. Chen , D. Hahner , M. Trubetskov , S. Schrameyer , W. Sakiew , K. Starke , V. Pervak

We have compared two kinds of dispersive mirrors (DMs) produced by magnetron sputtering and ion beam sputtering. One of them is a broadband DM which is known as double-angle DM, providing a group delay dispersion (GDD) of $$-40 \mathrm{{fs}}^2$$ - 40 fs 2 in the range of 550–1050 nm. The other one is a robust highly dispersive mirror, which provides a GDD of about $$-275 \mathrm{{fs}}^2$$ - 275 fs 2 at 800 nm and covers the wavelength range from 690 to 890 nm. For the first time, a comparison between magnetron-sputtering-produced and ion-beam-sputtering-produced dispersive mirrors is performed.

中文翻译:

色散镜上磁控溅射和离子束溅射的比较

我们比较了磁控溅射和离子束溅射两种色散镜 (DM)。其中之一是称为双角 DM 的宽带 DM,在 550– 范围内提供 $$-40 \mathrm{{fs}}^2$$ - 40 fs 2 的群延迟色散 (GDD) 1050 纳米。另一个是坚固的高色散反射镜,它在 800 nm 处提供约 $$-275 \mathrm{{fs}}^2$$ - 275 fs 2 的 GDD,并覆盖 690 至 890 nm 的波长范围。首次对磁控溅射生产的色散镜和离子束溅射生产的色散镜进行了比较。
更新日期:2020-04-15
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