Abstract

In this work, ruthenium coatings were obtained by the galvanostatic deposition onto a copper substrate. The amount of metallic deposit was increasing with the plating current. The XRD analysis identificated the phase composition and indicated that the change current density can significantly modify the grain orientation of deposits. Plating conditions influence on electrocatalytic performance of ruthenium layers were tested for hydrogen evolution reaction in 1 M NaOH solution. The best catalytic activity were obtained for sample deposited with –60 mA/cm², what can be connected with good crystallinity and more developed electroactive surface area.

中文翻译：

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恒电流条件下氯化物溶液中钌薄层电沉积工艺的研究

摘要

在这项工作中，通过在铝基板上进行恒流沉积获得了钌涂层。金属沉积物的数量随着电镀电流的增加而增加。XRD分析确定了相组成，并表明改变电流密度可以显着改变沉积物的晶粒取向。测试了电镀条件对钌层电催化性能的影响，测试了氢在1 M NaOH溶液中的析氢反应。对于以–60 mA / cm ²沉积的样品，可以获得最佳的催化活性，该样品可以具有良好的结晶度和更大的电活性表面积。