Gold nanoparticle thin films were deposited on copper substrate using electrophoretic deposition (EPD) method. At first, gold nanoparticles were synthesized, using pulsed laser ablation method of a high-purity gold target in distilled water. Ablation was carried out, employing the fundamental wavelength of a Q-switched Nd:YAG laser at 1064 nm and pulse width of 7 ns. Suspension of gold nanoparticle was used as the electrolyte of EPD, in which two copper electrodes with 7 mm gap were immersed. Five samples of gold nanoparticle thin films were prepared at different deposition times and applied voltages. Nanoparticles and thin films were characterized by different diagnostics such as X-ray diffraction pattern, atomic force microscopy (AFM), and scanning electron microscopy (SEM) images as well as optical spectroscopy. XRD pattern determined crystalline structure of gold thin films. SEM image showed the effect of deposition time and applied voltage on the morphology of deposited films. AFM results demonstrated the variations in roughness, thickness, and surface quality due to changes in applied voltage and deposition time. Also, the optical properties of thin films were studied by UV-vis reflection spectroscopy.

中文翻译：

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电泳沉积法制备的金纳米粒子薄膜的表征

使用电泳沉积 (EPD) 方法将金纳米粒子薄膜沉积在铜基板上。首先，在蒸馏水中使用高纯度金靶的脉冲激光烧蚀方法合成金纳米粒子。进行消融，采用 Q 开关 Nd:YAG 激光器的基本波长为 1064 nm，脉冲宽度为 7 ns。金纳米颗粒的悬浮液用作EPD的电解质，其中浸入两个7mm间隙的铜电极。在不同的沉积时间和施加的电压下制备了五个金纳米颗粒薄膜样品。纳米粒子和薄膜的特征在于不同的诊断方法，例如 X 射线衍射图、原子力显微镜 (AFM) 和扫描电子显微镜 (SEM) 图像以及光谱学。XRD 图案确定了金薄膜的晶体结构。SEM图像显示了沉积时间和施加电压对沉积膜形态的影响。AFM 结果表明，由于施加电压和沉积时间的变化，粗糙度、厚度和表面质量会发生变化。此外，通过紫外-可见反射光谱研究了薄膜的光学特性。