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Dual-Polarized Metal-Flare Sliced Notch Antenna Array
IEEE Transactions on Antennas and Propagation ( IF 5.7 ) Pub Date : 2020-04-01 , DOI: 10.1109/tap.2020.2969724
Rick W. Kindt , John T. Logan

This article presents a dual-polarized metal-flare sliced notch antenna (SNA) array comprising metallic Vivaldi flares “sliced” by air gaps. Aside from the slice gaps in the flares (supported with foam sheets in the array build), the SNA is an exact duplicate of a conventional all-metal Vivaldi array, against which the SNA is presented directly in a one-to-one comparison to isolate the effect of slicing on dual-polarized radiator performance. The SNA has very similar capabilities as the Vivaldi in all metrics (match, gain, port isolation, and bandwidth), except that the SNA demonstrates lower cross-polarization (cross-pol) across all scan angles and frequencies. Both arrays are optimally sampled and have excellent matching from 2.6 to 21.2 GHz with zero scan blindness out to wide angles. For this demonstration, uniform slices are introduced in the flares to satisfy a single design criterion of −10 dB cross-pol (relative to copolarized fields) for a 45° scan cone at all frequencies, culminating in a peak SNA cross-pol improvement of 35 dB (relative to the reference Vivaldi array). Infinite array predictions are followed up by measurements on a 256-port prototype aperture. This work demonstrates that the slicing technique can be applied to effectively mitigate high cross-pol in dual-polarized Vivaldi arrays without inhibiting other performance metrics.

中文翻译:

双极化金属耀斑切片槽口天线阵列

本文介绍了一种双极化金属耀斑切片凹口天线 (SNA) 阵列,包括由气隙“切割”的金属 Vivaldi 耀斑。除了耀斑中的切片间隙(由阵列构建中的泡沫板支撑)之外,SNA 是传统全金属 Vivaldi 阵列的精确复制品,SNA 直接与传统全金属 Vivaldi 阵列进行一对一比较隔离切片对双极化散热器性能的影响。SNA 在所有指标(匹配、增益、端口隔离和带宽)方面与 Vivaldi 具有非常相似的功能,除了 SNA 在所有扫描角度和频率上表现出较低的交叉极化 (cross-pol)。两个阵列都经过优化采样,并且在 2.6 至 21.2 GHz 范围内具有出色的匹配性,并且在广角范围内具有零扫描盲区。对于这次演示,在耀斑中引入了均匀切片,以满足 -10 dB 交叉极化(相对于共极化场)的单一设计标准,用于所有频率的 45° 扫描锥,最终使峰值 SNA 交叉极化提高 35 dB(相对于共极化场)到参考 Vivaldi 阵列)。无限阵列预测之后是对 256 端口原型孔径的测量。这项工作表明,切片技术可用于有效减轻双极化 Vivaldi 阵列中的高交叉极化,而不会抑制其他性能指标。无限阵列预测之后是对 256 端口原型孔径的测量。这项工作表明,切片技术可用于有效减轻双极化 Vivaldi 阵列中的高交叉极化,而不会抑制其他性能指标。无限阵列预测之后是对 256 端口原型孔径的测量。这项工作表明,切片技术可用于有效减轻双极化 Vivaldi 阵列中的高交叉极化,而不会抑制其他性能指标。
更新日期:2020-04-01
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