The main purpose of this presentation was to evaluate the performance of total reflection X‐ray fluorescence (TXRF) among conventional analytical techniques such as atomic absorption spectrometry (AAS), inductively coupled plasma‐optical emission spectrometry (ICP‐OES), and inductively coupled plasma‐mass spectrometry ICP‐MS). In order to perform the study, one sample and a blank acidified with nitric acid (2.0%–2.5% v/v) were distributed among 10 laboratories. The investigated analytes were arsenic, chromium, nickel, and lead within 0.050 to 1.50‐mg/L concentration range. A guide protocol was elaborated for the participants in order to normalize the manipulation of the samples. In the particular case of arsenic, atomic fluorescence spectrometry (AFS) was incorporated. The “E_n” statistical test was performed in order to evaluate the results reported by each participant against the assigned value of the sample. Results show an excellent performance of TXRF among the mentioned analytical techniques.

中文翻译：

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TXRF在其他竞争对手的分析技术中的表现

本演示文稿的主要目的是评估常规分析技术（例如原子吸收光谱法（AAS），电感耦合等离子体光谱发射光谱法（ICP-OES）和电感耦合等）中的全反射X射线荧光（TXRF）的性能。等离子体质谱法（ICP-MS）。为了进行研究，在10个实验室中分配了一个样品和一个用硝酸酸化的空白（2.0％–2.5％v / v）。被调查的分析物为砷，铬，镍和铅，浓度范围为0.050至1.50-mg / L。为参与者制定了指导协议，以规范样本的处理。在砷的特殊情况下，采用了原子荧光光谱法（AFS）。“ E _n进行了统计测试，以便根据样本的指定值评估每个参与者报告的结果。结果表明，在提到的分析技术中，TXRF具有出色的性能。