The article provides a review of the current state of affairs in the field of physics and technology of multilayer beryllium-containing mirrors intended for projection lithography and solar corona studies in the extreme ultraviolet (EUV) region. The methods of synthesizing and studying beryllium-containing multilayer mirrors are described. The results of recent studies on the internal structure and EUV reflection coefficients are given for Mo/Be, Mo/Si, Be/Al, and Be/Mg multilayer mirrors. The effect of Si and Be interlayers on the reflectivity is explained. Avenues for further research on beryllium-containing mirrors are discussed.

中文翻译：

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铍基多层X射线光学器件

本文概述了用于多层光刻的含铍铍镜的物理和技术领域的现状，该多层铍镜用于在远紫外（EUV）区域进行投影光刻和太阳电晕研究。描述了合成和研究含铍多层镜的方法。给出了关于Mo / Be，Mo / Si，Be / Al和Be / Mg多层反射镜的内部结构和EUV反射系数的最新研究结果。解释了Si和Be中间层对反射率的影响。讨论了进一步研究含铍镜的途径。