Abstract Gold-implanted aluminum films are used to investigate how reflection electron energy loss spectra (REELS) change due to the presence of a small concentration of heavy atoms at a specific depth. Au ions were implanted with 30, 100 and 300 keV energy. REELS spectra were taken at energies between 10 and 40 keV. Large changes in the REELS spectra are observed after Au implantation, but the nature of the change indicates that they are not due to modification of the dielectric function of the implanted layer, but should be interpreted as changes in the partial intensities that make up the spectrum. Two models are used to describe the results quantitatively. One method assumes v-shaped trajectories (i.e. only a single elastic deflection) and the REELS spectrum can then be calculated in a closed form. The other method is a Monte-Carlo based simulation which allows for multiple elastic deflections. Both methods describe the experimental spectra quite well, but at larger energy losses significant deviations occur between the measured and calculated intensity for both the implanted and not-implanted films. The difference in the REELS spectrum before and after implantation is less affected by these discrepancies, and can be used to obtain an estimate of both the depth and concentration of the implanted Au atoms. Due to the presence of sharp plasmon features in the energy loss spectrum of aluminum the experiment can tell us directly which partial intensities are affected by the Au impurities, as the recoil energies due to elastic scattering make it possible to identify the contribution of Au to the first few plasmons. As the Au implantation fluence is known the measurement can be used to determine the ratio of the Au and Al elastic scattering cross sections, which deviates strongly from that calculated from the Rutherford formula.

中文翻译：

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离子注入对反射电子能量损失谱的影响：以Au注入Al薄膜为例

摘要 注入金的铝膜用于研究反射电子能量损失光谱 (REELS) 如何因特定深度处存在小浓度重原子而发生变化。Au离子以30、100和300 keV的能量注入。REELS 光谱是在 10 和 40 keV 之间的能量下拍摄的。Au注入后观察到REELS光谱的大变化，但变化的性质表明它们不是由于注入层的介电函数的改变，而应解释为构成光谱的部分强度的变化. 两个模型用于定量描述结果。一种方法假设 V 形轨迹（即只有单个弹性偏转），然后可以以封闭形式计算 REELS 谱。另一种方法是基于蒙特卡罗的模拟，它允许多个弹性变形。两种方法都很好地描述了实验光谱，但是在较大的能量损失下，植入和未植入薄膜的测量强度和计算强度之间会出现显着偏差。注入前后 REELS 光谱的差异受这些差异的影响较小，可用于获得注入金原子的深度和浓度的估计值。由于铝的能量损失谱中存在尖锐的等离子体特征，该实验可以直接告诉我们哪些部分强度受 Au 杂质的影响，因为弹性散射引起的反冲能量使我们有可能确定 Au 对前几个等离子体。