当前位置:
X-MOL 学术
›
Diam. Relat. Mater.
›
论文详情
Our official English website, www.x-mol.net, welcomes your feedback! (Note: you will need to create a separate account there.)
Reactive ion etching of single crystal diamond by inductively coupled plasma: State of the art and catalog of recipes
Diamond and Related Materials ( IF 4.1 ) Pub Date : 2020-04-05 , DOI: 10.1016/j.diamond.2020.107839 A. Toros , M. Kiss , T. Graziosi , S. Mi , R. Berrazouane , M. Naamoun , J. Vukajlovic Plestina , P. Gallo , N. Quack
中文翻译:
通过感应耦合等离子体对单晶金刚石进行反应性离子蚀刻:最新技术和配方目录
更新日期:2020-04-05
Diamond and Related Materials ( IF 4.1 ) Pub Date : 2020-04-05 , DOI: 10.1016/j.diamond.2020.107839 A. Toros , M. Kiss , T. Graziosi , S. Mi , R. Berrazouane , M. Naamoun , J. Vukajlovic Plestina , P. Gallo , N. Quack
中文翻译:
通过感应耦合等离子体对单晶金刚石进行反应性离子蚀刻:最新技术和配方目录