Abstract Atomic layer deposition (ALD) is a conformal, homogeneous and uniform technique, ideal characteristics for optical waveguides. Recent investigations prove that the advantages of ALD tend to reduce optical losses in submicron waveguides. Al2O3 and Y2O3 are known as optical materials with transparency characteristics in the visible-NIR region, which allow application sensors and telecommunications. In this work, Al2O3-Y2O3 nanolaminates films grown at 250 °C by thermal ALD were used as core for slab waveguides. Different proportions of Y2O3 were used, setting the total nanolaminate thickness at 500 nm. Refractive index of materials was estimated by Spectroscopic Ellipsometry, effective refractive index of waveguides at 632.8 nm was determined by prism coupling, and propagation loss coefficient were measured for a fiber-to-waveguide coupling setup. Microanalysis of samples was made by means of Scanning Electron Microscopy (SEM) and Transmission Electron Microscopy (TEM). Propagation of all samples was demonstrated at 632.8 nm.

中文翻译：

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原子层沉积 Al2O3-Y2O3 纳米层压板条光波导

摘要 原子层沉积（ALD）是一种保形、均质和均匀的技术，是光波导的理想特性。最近的研究证明，ALD 的优势倾向于减少亚微米波导中的光损耗。Al2O3 和 Y2O3 是已知的光学材料，在可见光-近红外区域具有透明特性，可用于传感器和电信。在这项工作中，通过热 ALD 在 250°C 下生长的 Al2O3-Y2O3 纳米层压薄膜被用作平板波导的核心。使用不同比例的 Y2O3，将总纳米层压厚度设置为 500 nm。材料的折射率通过光谱椭偏法估计，波导在 632.8 nm 处的有效折射率通过棱镜耦合确定，测量光纤到波导耦合设置的传播损耗系数。通过扫描电子显微镜 (SEM) 和透射电子显微镜 (TEM) 对样品进行微量分析。在 632.8 nm 处证明了所有样品的传播。