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One-step electrochemical deposition of thin film titanium suboxide in basic titanyl sulfate solution at room temperature
Journal of Solid State Electrochemistry ( IF 2.5 ) Pub Date : 2020-03-21 , DOI: 10.1007/s10008-020-04555-9
Zeliha Ertekin , Nuran Özçiçek Pekmez , Kadir Pekmez

Abstract

This study reports direct electrodeposition of TiOx thin films on ITO substrate from an acetonitrile solution containing titanyl sulfate and tetra n-butyl ammonium hydroxide. The electrochemical behavior of titanyl sulfate in a basic medium is investigated using cyclic voltammetry. In this medium, different phases and/or compositions containing Ti3O5 (βTi3O5, λTi3O5, and ɣTi3O5) and Ti4O7 are obtained depending on electrolysis potential values (− 1.2 V, − 1.5 V, − 1.7 V, and − 2.0 V). The electrochemical properties of the TiOx coatings obtained from various cathodic potentials are investigated using electrochemical impedance spectroscopy (EIS). Depending on the increase of electrolysis potential values applied, thicker films with lower resistance are formed. The EIS analysis results are compatible with the results of XRD and SEM, which confirms the change of phase content and/or composition in the films obtained at different electrolysis potential values. The estimated band gaps of brownish thin films are obtained between 1.32 and 1.41 eV using UV–vis spectra. Herein the electrochemical deposition of crystalline TiOx films on ITO electrode is carried out at room temperature by a cost-effective and one-step method in basic acetonitrile solution.



中文翻译:

在室温下在碱性钛氧基硫酸盐溶液中一步法电化学沉积薄膜氧化钛

摘要

这项研究报道了从含有硫酸氧钛和氢氧化四正丁铵的乙腈溶液直接在ITO基板上电沉积TiO x薄膜。使用循环伏安法研究了硫酸氧钛在碱性介质中的电化学行为。在此培养基中,不同的相位和/或含钛的组合物3 ø 5(βTi 3 ø 5,λTi 3 ø 5,和ɣTi 3 ö 5)和Ti 4 ö 7 1.2 V, -取决于电解电势值(获得- 1.5 V,-1.7 V和-2.0 V)。TiO x的电化学性质使用电化学阻抗谱(EIS)研究了从各种阴极电势获得的涂层。取决于施加的电解电势值的增加,形成具有较低电阻的较厚的膜。EIS分析结果与XRD和SEM的结果兼容,这证实了在不同电解电位值下获得的膜中相含量和/或组成的变化。使用紫外可见光谱可在1.32至1.41 eV之间获得带褐色薄膜的估计带隙。本文中,在室温下通过经济高效的一步法在碱性乙腈溶液中在ITO电极上进行结晶TiO x膜的电化学沉积。

更新日期:2020-03-21
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